专利名称：Method and apparatus for assessing the
quality of a process model
发明人：Lawrence S. Melvin,Qiliang Yan申请号：US11243306申请日：20051003
公开号：US20060236297A1公开日：20061019
专利附图：
摘要：One embodiment of the present invention provides a system that assesses thequality of a process model. During operation, the system receives a mask layout andadditionally receives a process model that models the effects of one or more
semiconductor manufacturing processes on the mask layout. Next, the system computesa gradient of the process model with respect to a process model parameter. The systemthen computes a quality indicator at an evaluation point in the mask layout using thegradient of the process model and the mask layout. Next, the system assesses thequality of the process model using the quality indicator. In one embodiment, the systemassesses the quality of the process model by comparing the quality indicator with athreshold.
申请人：Lawrence S. Melvin,Qiliang Yan
地址：Hillsboro OR US,Portland OR US
国籍：US,US
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